The NanoSpec 6100 thin film thickness measurement system utilizes non-contact spectroscopic reflectometry to measure sites as small as 25 µm in diameter on reflecting substrates. The object measures film thicknesses in the range of 200 Å – 20 µm with the visible light source and 25 Å – 20 µm with the UV light source. Substrates up to 200 mm in diameter can be measured on the system. It uses a computerized sample stage and an auto focus system to rapidly generate 2D and 3D film thickness uniformity maps and statistics. These features are very useful for optimizing the uniformity of thin film deposition and etch processes. The object is also capable of measuring multiple layers if the optical constants of the materials are known.
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