The JetFirst 200 is a halogen lamp heated Rapid Thermal Process system that is capable of rapidly heating samples from ambient up to 1200 C. The object is provided with closed loop temperature control set by either a thermocouple or optical pyrometer. The reaction chamber can accommodate wafers up to 200 mm in diameter with the option of either a silicon or silicon carbide susceptor. Available chamber ambients are argon, nitrogen, oxygen, forming gas, or vacuum. A software interface provides easy recipe programming and monitoring of the system.
JetFirst 200 Calibrations – December 2009 Calibrations
Posted under Cleanroom