This new and innovative photolithography system arrived in the cleanroom in the summer of 2021, and it is located in Bay 5. It is available to users, and its capabilities are still being explored in process development.
Key features of the tool include:
- Writing resolution down to 1.5 um
- Adjustable writing field and resolution with exchangeable objective lenses
- Compatible with CAD or bitmap images
- Compatible with i, h, and g-line photoresists and a wide range of substrate materials and substrate sizes up to 5″ x 5″
- Camera feedback for alignment steps
Equipment Overview & Photoresist Selection
Posted under Cleanroom