The ATC Orion sputter deposition system, by AJA International, has the capability to co-sputter conductive and insulating materials on substrates up to 100 mm in diameter. In addition to Ar sputtering, N2 or O2 are also available for use in reactive-ion sputtering. The UTD object is equipped with 3 RF and 2 DC magnetron sources. The substrate is capable of heating to 800 C while under rotation as well as exposure to reactive gasses and RF bias. Software for control of the various source shutters is also available for automated film stack deposition.
Process Data
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Helpful Resources
This is where the Sample holder and Motor spindle line up as viewed through the viewport! [Watch Video]
AJA1 Sample Alignment Holder [Watch Video]
Ti sputtering affect as Pressure is Modified [Watch Video]
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