PD03 is a PlasmaTherm Vision 310 plasma enhanced chemical vapor deposition (PECVD) instrument in service since 2021. It deposits high-quality silicon oxide of uniform thickness across the whole sample platen at 300 degree C deposition temperature. It also supports silicon carbide films deposition using various custom recipes developed at UT Dallas.
Qualification data for PD01, PD02 & PD03
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