TC02 Ultratech/Cambridge NanoTech Savannah 100 Atomic Layer Deposition

The Atomic Layer Deposition system deposits thin films of dielectrics such as hafnium oxide, silicon oxide, and aluminum oxide. The tool can be configured for titanium oxide upon user request. The tool can easily switch from water to ozone precursor. Users may request additional training on the ozone generator.

Mini-qualification runs (bi-weekly)

Qualification Data

Qualification Data (Al₂O₃)-Quarterly

Qualification Data (HfO₂)-Quarterly

Process Data

Process Data: 10nm Al2O3

Process Data: 10nm HfO2 with H2O

Process Data: 10nm HfO2 with O3

Control Chart

Control Chart: 10nm Al2O3

By sxg037100
Posted under Cleanroom