The Atomic Layer Deposition system deposits thin films of dielectrics such as hafnium oxide, silicon oxide, and aluminum oxide. The tool can be configured for titanium oxide upon user request. The tool can easily switch from water to ozone precursor. Users may request additional training on the ozone generator.
Process Data
Process Data: 10nm HfO2 with H2O
Process Data: 10nm HfO2 with O3
Control Chart
Posted under Cleanroom